X-Ray Method for the Differentiation of {111} Surfaces in AIIIBV Semiconducting Compounds

Abstract
Most of the AIIIBV semiconducting compounds have the zincblende crystal structure. This structure is noncentrosymmetric and as a consequence the modulii of F(hkl) and F(h̄k̄l̄), the geometrical structure factors, have different magnitudes. This difference results in a variation in the integrated intensities of certain x‐ray reflection from opposite sides of samples taken from crystals with the zincblende structure. X‐ray measurements of a series of {111} reflections from opposite sides of an InAs single crystal have been made and related to the etching characteristics of these surfaces.

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