Fluoropolymer Resist Materials for 157nm Microlithography.
- 1 January 2001
- journal article
- Published by Technical Association of Photopolymers, Japan in Journal of Photopolymer Science and Technology
- Vol. 14 (4) , 669-674
- https://doi.org/10.2494/photopolymer.14.669
Abstract
Fluorocarbon polymers and siloxane-based polymers have been identified as promising resist candidates for 157nm material design because of their relatively high transparency at this wavelength. This paper reports our recent progress toward developing 157nm resist materials based on the first of these two polymer systems. Polymers based on fluorinated norbornenes have been prepared and preliminary imaging studies at 157nm are described. Functional norbornenes having α-trifluoromethyl groups could not be polymerized by either Ni(II) or Pd(II) catalysts. Several new approaches to incorporating these transparent monomers into functional polymers have been investigated and are described. The lithographic performance of some of these polymers is discussed.Keywords
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