Interface characterization of XUV multilayer reflectors using HRTEM and x-ray and XUV reflectance

1 February 1991

proceedings article
Published by SPIE-Intl Soc Optical Eng

Vol. 1343, 292-309
https://doi.org/10.1117/12.23202

Abstract

The structure of XUV multilayer coatings has been examined using high-resolution transmission electron microscopy. A variety of techniques have been used to measure the interface widths and the interface topography from the digitized TEM images and the results have been compared with X-ray and XUV reflectance measurements. It is found that the structural parameters measured from the TEM images and those deduced from reflectance are consistent in light of the probable systematic errors associated with the measurement and interpretation techniques.

Keywords

INTERFACES
REFLECTIVITY
TRANSMISSION ELECTRON MICROSCOPY
SURFACE ROUGHNESS
ELECTRON MICROSCOPE
SYSTEMATIC ERROR
HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY
EXTREME ULTRAVIOLET
IMAGE PROCESSING
OPTICAL COATINGS

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