R.f.-sputtered indium tin oxide films on water-cooled substrates
- 1 December 1988
- journal article
- research article
- Published by Elsevier in Thin Solid Films
- Vol. 167 (1-2) , L11-L14
- https://doi.org/10.1016/0040-6090(88)90511-1
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- Properties of Sn-doped In2O3 by reactive magnetron sputtering and subsequent annealingJournal of Vacuum Science & Technology A, 1987
- Properties of tin doped indium oxide thin films prepared by magnetron sputteringJournal of Applied Physics, 1983
- Preparation of conducting and transparent thin films of tin-doped indium oxide by magnetron sputteringApplied Physics Letters, 1980