Intense lasing in discharge excited noble-gas monochlorides
- 1 September 1978
- journal article
- research article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 33 (5) , 419-421
- https://doi.org/10.1063/1.90407
Abstract
Intense lasing of XeCl (180 mJ) and KrCl (100 mJ) occurs using HCl as the halogen doner. The low energies obtained from e‐beam devices are believed to result from Ar+2 molecular‐ion absorption. Very long XeCl lasing lifetime with respect to gas fill is observed; this is postulated to be the result of photodissociation of Cl2 due to the laser wavelength which, in turn, results in enhanced rates for the formation of HCl.Keywords
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