Sidewall and surface induced damage comparison between reactive ion etching and inductive plasma etching of InP using a CH4/H2/O2 gas mixture
- 1 May 1996
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology A
- Vol. 14 (3) , 1056-1061
- https://doi.org/10.1116/1.580133
Abstract
No abstract availableThis publication has 0 references indexed in Scilit: