Experiments for 3-D structuring of thick resists by gray tone lithography
- 1 October 2000
- journal article
- Published by Elsevier in Materials Science in Semiconductor Processing
- Vol. 3 (5-6) , 569-573
- https://doi.org/10.1016/s1369-8001(00)00086-x
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- New method to design halftone mask for the fabrication of continuous microrelief structurePublished by SPIE-Intl Soc Optical Eng ,1999
- General aspheric refractive micro-optics fabricated by optical lithography using a high energy beam sensitive glass gray-level maskJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1996
- Simulation and experimental study of gray-tone lithography for the fabrication of arbitrarily shaped surfacesPublished by Institute of Electrical and Electronics Engineers (IEEE) ,1994