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Plasma Etching of Refractory Gates for VLSI Applications
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Plasma Etching of Refractory Gates for VLSI Applications
Plasma Etching of Refractory Gates for VLSI Applications
TC
T. P. Chow
T. P. Chow
A. J. Steckl
A. J. Steckl
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1 October 1984
journal article
Published by
The Electrochemical Society
in
Journal of the Electrochemical Society
Vol. 131
(10)
,
2325-2335
https://doi.org/10.1149/1.2115251
Abstract
No abstract available
Keywords
PLASMA ETCHING
Cited
Cited by 28 articles
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