Passivation of Aluminum by Chromate Solutions

Abstract
Passive films of formed on aluminum by chromate solutions exhibit lower ionic resistance and higher electronic resistance than amorphous thermal films of the same thickness. The low ionic resistance is attributed to the formation of some crystalline of very low ionic resistance at the oxide solution interface. The high electronic resistance is attributed to the inclusion of some protons in the passive film. A detailed mechanism for the passivation process is advanced.

This publication has 0 references indexed in Scilit: