Laser writing on metal-silicon bilayers for optical storage. I. Optical properties
- 1 May 1982
- journal article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 53 (5) , 3777-3783
- https://doi.org/10.1063/1.331118
Abstract
Various bilayer structures consisting of metal and silicon were investigated as possible candidates for the optical recording medium. The silicon-on-metal bilayers offer tunability with a reasonable thickness of Si in the visible spectrum with a typical reflectivity less than 5%. Of the two possible writing processes, the low-power process of silicide formation has a threshold power of 30 mW for a Rh-Si bilayer which provides a reflectivity change in excess of 40%. The absence of raised rims around the written spots offers a smooth morphology that is compatible with encapsulation.This publication has 4 references indexed in Scilit:
- Silicide films for archival optical storageApplied Physics Letters, 1981
- Computer assisted enhanced reflectance data acquisitionOptics Communications, 1981
- Bit oriented optical storage with thin tellurium filmsJournal of Vacuum Science and Technology, 1981
- Observations of stresses in thin films of palladium and platinum silicides on siliconJournal of Vacuum Science and Technology, 1980