Structural studies of chemically vapour-deposited tin oxide films
- 1 February 1983
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 100 (3) , 219-225
- https://doi.org/10.1016/0040-6090(83)90279-1
Abstract
No abstract availableKeywords
This publication has 12 references indexed in Scilit:
- Physical properties of tin oxide films deposited by oxidation of SnCl2Thin Solid Films, 1982
- Preparation by reactive deposition and some physical properties of amorphous tin oxide films and crystalline SnO2 filmsThin Solid Films, 1981
- Structural characterization of transparent semiconducting thin films of SnO2 and In2O3Thin Solid Films, 1981
- Deposition of In2O3SnO2 layers on glass substrates using a spraying methodThin Solid Films, 1981
- X-ray and electron diffraction studies of chemically vapour-deposited tin oxide filmsThin Solid Films, 1981
- Linewidth Measurement of a Single Longitudinal Mode AlGaAs Laser with a Fabry-Perot InterferometerJapanese Journal of Applied Physics, 1980
- Physical Properties of SnO2 Materials: III . Optical PropertiesJournal of the Electrochemical Society, 1976
- Physical Properties of SnO2 Materials: II . Electrical PropertiesJournal of the Electrochemical Society, 1976
- Physical Properties of SnO2 Materials: I . Preparation and Defect StructureJournal of the Electrochemical Society, 1976
- Preparation of Thick Crystalline Films of Tin Oxide and Porous Glass Partially Filled with Tin OxideJournal of the Electrochemical Society, 1969