Ionization Processes on Tungsten Filaments II. The Absorption of Fluorine on Tungsten

1 August 1948

journal article
research article
Published by AIP Publishing in The Journal of Chemical Physics

Vol. 16 (8) , 779-781
https://doi.org/10.1063/1.1746996

Abstract

Fluorine is found to form an adsorbed film on tungsten stable to temperatures above 2600°K. This causes a low accommodation for the thermal dissociation of fluorine. The adsorption is compared to that of oxygen on tungsten.

Keywords

TEMPERATURE
TUNGSTEN
SURFACES
ATOMS
ADSORPTION
STABILITY
ABSORPTION
DECOMPOSITION
SURFACE TEMPERATURE
LAYERS
FLUORINE
IONIZATION

This publication has 3 references indexed in Scilit:

Ionization Processes on Tungsten Filaments I. The Electron Affinity of the Oxygen Atom
The Journal of Chemical Physics, 1948
Thermodynamic Properties of Hydrogen Fluoride and Fluorine from Spectroscopic Data
The Journal of Chemical Physics, 1939
Die Gitterenergie der Alkalihalogenide und die Elektronenaffinität der Halogene
The European Physical Journal A, 1932