All Dry Lithography: Applications of Plasma Polymerized Methylsilane as aSingle Layer Resist and Silicon Dioxide Precursor.
- 1 January 1995
- journal article
- Published by Technical Association of Photopolymers, Japan in Journal of Photopolymer Science and Technology
- Vol. 8 (4) , 679-686
- https://doi.org/10.2494/photopolymer.8.679
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