Annealing and rolling behaviors of concentration profiles of Cr and Cu implanted into mild steel

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Abstract
Concentration profiles of 52Cr and 63Cu implanted in mild steel have been measured by means of ion microprobe analysis in order to investigate annealing and rolling behaviors of implanted ions. Ion implantation has been performed with the dose of 1017 ions/cm2 at the energy of 150 keV. The concentration profile of as-implanted Cu exhibits the deeper penetration and its peak exists at the shallower region, compared with the depth distribution predicted by the LSS theory. The Cu maximum concentration after annealing decreases. It also decreases, being rolled, and its depth approaches near the surface. The concentration profile of as-implanted Cr has two peaks, of which the presence can not be predicted by the LSS theory. Chromium concentrations after annealing at 700°C decrease. The profile in the specimen rolled after ion implantation shows an exponential decrease inwards from the surface. These results are explained by sputtering, enhanced diffusion, thermodynamic, and rolling effects.

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