Quantification of metal trace contaminants on Si wafer surfaces by Laser-SNMS and TOF-SIMS using sputter deposited submonolayer standards
- 1 July 1996
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
- Vol. 14 (4) , 2712-2724
- https://doi.org/10.1116/1.589009
Abstract
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