Long range migration of niobium during the anodic oxidation of tantalum on niobium and aluminum on niobium duplex layers
- 15 July 1974
- journal article
- Published by Elsevier in Solid State Communications
- Vol. 15 (2) , 259-264
- https://doi.org/10.1016/0038-1098(74)90753-4
Abstract
No abstract availableKeywords
This publication has 8 references indexed in Scilit:
- Principles and applications of ion beam techniques for the analysis of solids and thin filmsThin Solid Films, 1973
- The Use of Rutherford Backscattering to Study the Behavior of Ion-Implanted Atoms During Anodic Oxidation of Aluminum: Ar, Kr, Xe, K, Rb, Cs, Cl, Br, and lJournal of the Electrochemical Society, 1973
- The Migration of Oxygen during the Anodic Oxidation of TantalumJournal of the Electrochemical Society, 1973
- Transient Response of the System Ta?Ta[sub 2]O[sub 5]?ElectrolyteJournal of the Electrochemical Society, 1973
- Microanalysis by the direct observation of nuclear reactions using a 2 MeV Van de GraaffNuclear Instruments and Methods, 1971
- The Migration of Metal and Oxygen during Anodic Film FormationJournal of the Electrochemical Society, 1965
- The mechanism of anodic oxidationJournal of Physics and Chemistry of Solids, 1962
- ANODIC OXIDE FILMS ON NIOBIUM: THICKNESS, DIELECTRIC CONSTANT, DISPERSION, REFLECTION MINIMA, FORMATION FIELD STRENGTH, AND SURFACE AREACanadian Journal of Chemistry, 1960