Preparation of Thin-Film Diffusion Microcouples in Ternary Alloys
- 1 May 1973
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science and Technology
- Vol. 10 (3) , 445-449
- https://doi.org/10.1116/1.1317086
Abstract
A feedback-controlled three-source evaporator system is described. Its purpose is the preparation of multilayered thin-film specimens to be used for the study of diffusion in ternary alloys. It is shown that, with this system, it is possible to prepare thin films representing a variety of binary or ternary diffusion microcouples with specified layer thickness and specified composition ratios of the alloy components. The uniformity of thickness of each layer, essential for diffusion studies, was confirmed by the appearance of satellite intensity maxima around x-ray fundamental reflections from an AgAuPd solid solution alloy in this system.Keywords
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