Comparison of negative tone resists NEB22 and UVN30 in e-beam lithography

• 30 June 2000
• journal article
• Published by Elsevier in Microelectronic Engineering
• Vol. 53  (1-4) , 461-464
• https://doi.org/10.1016/s0167-9317(00)00356-7

Abstract

Keywords

• BEAM
• LITHOGRAPHY
• MIX
• NOVOLAC
• PEB
• SLIGHTLY
• POORER
• CHF3/O2
• UVN30
• NEB22