Effect of annealing on photorefractive damage in titanium-indiffused LiNbO/sub 3/ modulators
- 1 February 1994
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Photonics Technology Letters
- Vol. 6 (2) , 211-213
- https://doi.org/10.1109/68.275431
Abstract
We have evaluated photorefractive effects at 1320-nm and 1064-nm optical wavelengths in interferometric modulators built using Ti-indiffused waveguides in lithium niobate. The sensitivity to photorefractive damage is substantially increased by anneals in non-oxygen atmospheres at temperatures /spl ges/200/spl deg/C. The sensitivity can be reduced by an anneal in oxygen. Properly annealed modulators operated for 150 h with 400 mW at 1320 nm with no photorefractive effects other than a 3/spl deg/ change in bias point.Keywords
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