Reduction of thermally grown SiO2 by Al films
- 16 October 1974
- journal article
- research article
- Published by Wiley in Physica Status Solidi (a)
- Vol. 25 (2) , 645-651
- https://doi.org/10.1002/pssa.2210250234
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- Thin‐Film Studies of the Reduction of SiO2 by AlJournal of the American Ceramic Society, 1973
- Failure of aluminium contacts to silicon in shallow diffused transistorsMicroelectronics Reliability, 1970
- Reaction Between Vitreous Silica and Molten AluminumJournal of the American Ceramic Society, 1967