Monolayer and Bilayer High Steps on Si(001)2×1 Vicinal Surface
- 1 July 1987
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 26 (7A) , L1186
- https://doi.org/10.1143/jjap.26.l1186
Abstract
Atomic steps on Si(001)2×1 surfaces are observed by reflection electron microscopy. On the Si(001)2×1 vicinal surface having the inclination of 0.01°-0.1° towards the [100], the 2×1 and 1×2 domains are formed alternately, being separated by a monolayer-high step. The width of the terrace varies systematically from domain to domain. This is explained by the fact that the dimers tend to aligh parallel to the step, running along the [110] or [1̄10] direction; the domain in which the dimers are aligned parallel to the step expands and the other domain shrinks.Keywords
This publication has 7 references indexed in Scilit:
- UHV-REM Study of Changes in the Step Structures on Clean (100) Silicon Surfaces by AnnealingJapanese Journal of Applied Physics, 1987
- Biatomic Layer-High Steps on Si(001)2×1 SurfaceJapanese Journal of Applied Physics, 1987
- Effects of the Substrate Offset Angle on the Growth of GaAs on Si SubstrateJapanese Journal of Applied Physics, 1986
- Si(001)-2×1 Single-Domain Structure Obtained by High Temperature AnnealingJapanese Journal of Applied Physics, 1986
- Reflection Electron Microscope Observations of Dislocations and Surface Structure Phase Transition on Clean (111) Silicon SurfacesJapanese Journal of Applied Physics, 1980
- LEED study of the stepped surface of vicinal Si (100)Surface Science, 1980
- Techniques for routine UHV in situ electron microscopy of growth processes of epitaxial thin filmsJournal of Physics E: Scientific Instruments, 1978