Investigation of oxide particles in Czochralski silicon heat treated for intrinsic gettering using scanning infrared microscopy
- 18 December 1989
- journal article
- conference paper
- Published by AIP Publishing in Applied Physics Letters
- Vol. 55 (25) , 2625-2627
- https://doi.org/10.1063/1.101956
Abstract
The precipitation of oxygen in Czochralski silicon slices and the effect of the resulting oxide particles on the gettering of copper have been investigated. The scanning infrared microscope was used to investigate individual particles within the bulk slices. Quantitative data on particle densities and distributions, and surface denuded zone depths for low particle densities were obtained. A major change in the precipitation behavior of copper was observed on going from just below to just above the threshold oxide precipitation level for gettering to occur.Keywords
This publication has 3 references indexed in Scilit:
- Characterization of haze-forming precipitates in siliconJournal of Applied Physics, 1988
- Formation of Nuclei of Oxygen Precipitates in CZ Silicon Crystals during Crystal Growth ProcessJournal of the Electrochemical Society, 1988
- Infrared laser scanning microscopy in transmission: A new high-resolution technique for the study of inhomogeneities in bulk GaAsApplied Physics Letters, 1987