Low temperature selective crystallization of amorphous silicon
- 1 December 1989
- journal article
- Published by Elsevier in Journal of Non-Crystalline Solids
- Vol. 115 (1-3) , 66-68
- https://doi.org/10.1016/0022-3093(89)90362-1
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- Selective area crystallization of amorphous silicon films by low-temperature rapid thermal annealingApplied Physics Letters, 1989
- Crystallized Si films by low-temperature rapid thermal annealing of amorphous siliconJournal of Applied Physics, 1989
- Optical and photoconductive properties of discharge-produced amorphous siliconJournal of Applied Physics, 1977
- Nonlocal pseudopotential calculations for the electronic structure of eleven diamond and zinc-blende semiconductorsPhysical Review B, 1976