Ion beam induced chemical vapor deposition for the preparation of thin film oxides
- 1 April 1994
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 241 (1-2) , 198-201
- https://doi.org/10.1016/0040-6090(94)90425-1
Abstract
No abstract availableThis publication has 9 references indexed in Scilit:
- XAS and XRD structural studies of titanium oxide thin films prepared by ion beam induced CVDThin Solid Films, 1994
- Deposition of optical coatings by laser-assisted evaporation and by photo-assisted chemical vapor depositionThin Solid Films, 1992
- Plasma ion-assisted deposition: A promising technique for optical coatingsJournal of Vacuum Science & Technology A, 1992
- Plasma-enhanced metalorganic chemical vapor deposition of BaTiO3 filmsJournal of Vacuum Science & Technology A, 1992
- Preparation and properties of (Pb,La)(Zr,Ti)O3 thin films by metalorganic chemical vapor depositionJournal of Applied Physics, 1992
- Titanium oxide formation by dynamic ion beam mixingJournal of Vacuum Science & Technology A, 1991
- Photoemission and electron microscopy of small supported palladium clustersSurface Science, 1991
- Determination of the thickness and optical constants of amorphous siliconJournal of Physics E: Scientific Instruments, 1983
- Titanium Dioxide Coatings. Room Temperature DepositionProduct R&D, 1972