High performance "Upward" Bipolar technology for VLSI

• 1 January 1978
• conference paper
• Published by Institute of Electrical and Electronics Engineers (IEEE)
• p. 209-212
• https://doi.org/10.1109/iedm.1978.189389

Abstract

Keywords

• VERY LARGE SCALE INTEGRATION
• DOPING
• CIRCUITS
• IMPURITIES
• BORON
• SUBSTRATES
• OXIDATION
• IMPLANTS
• TELEPHONY
• LABORATORIES