Uniformity and high temperature performance of X-band nitride power HEMTs fabricated from 2-inch epitaxy
- 1 December 1998
- journal article
- Published by Elsevier in Solid-State Electronics
- Vol. 42 (12) , 2183-2185
- https://doi.org/10.1016/s0038-1101(98)00214-7
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- High-temperature performance of AlGaN/GaN HFETs on SiC substratesIEEE Electron Device Letters, 1997
- Optimization of III-N Based Devices Grown by RF Atomic Nitrogen Plasma Using In-Situ CathodoluminescenceMRS Proceedings, 1997
- High temperature characteristics of AlGaN/GaN modulation doped field-effect transistorsApplied Physics Letters, 1996