Abstract
Neon ion bombardment followed by field evaporation is shown to be a simple, effective procedure for cleaning the surface of nickel field-ion samples. The neon ions are generated by reversing the tip polarity and establishing a field emission current in the presence of the neon imaging gas. The procedure removes surface impurities which are resistant to field desorption at the evaporation field of nickel. The experimental conditions required to clean a nickel surface are presented.

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