Isotropic Stress Measurements in Permalloy Films
- 1 March 1962
- journal article
- research article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 33 (3) , 1166-1167
- https://doi.org/10.1063/1.1728644
Abstract
Isotropic stress measurements in Permalloy films have been carried out as a function of thickness, rate of deposition, and substrate temperature. The measurements were made by clamping one end of a substrate consisting of a thin strip of glass or mica and observing the deflection of the free end during deposition. Results indicate that the stress is independent of thickness in the range 100–2000 A. However, depending upon the values of the other deposition parameters, one may observe either tensile, compressive, or zero stress.This publication has 6 references indexed in Scilit:
- Oblique-Incidence Anisotropy in Evaporated Permalloy FilmsJournal of Applied Physics, 1960
- The Cause of Stress in Evaporated Metal FilmsProceedings of the Physical Society. Section B, 1954
- The Origin of Stress in Metal Layers Condensed from the Vapour in High VacuumProceedings of the Physical Society. Section B, 1953
- Evidence for Collapse of Lattice Vacancy Aggregates to Form Dislocation RingsJournal of Applied Physics, 1953
- Calculation of stress in electrodeposits from the curvature of a plated stripJournal of Research of the National Bureau of Standards, 1949
- The tension of metallic films deposited by electrolysisProceedings of the Royal Society of London. Series A, Containing Papers of a Mathematical and Physical Character, 1909