Three dimensional electron optical modeling of scanning tunneling microscope lithography in resists
- 1 November 1996
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
- Vol. 14 (6) , 4148-4152
- https://doi.org/10.1116/1.588609
Abstract
No abstract availableKeywords
This publication has 0 references indexed in Scilit: