Further improvements in calibration techniques for depth profiling with glow discharge optical emission spectrometry

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Abstract
Quantitative in-depth profiling with glow discharge optical emission spectrometry is discussed. Recent experimental work on the variations in emission intensity with the discharge parameters is presented. An improved empirical intensity expression, which has been incorporated in a quantification model, is proposed. In particular, the proposed model compensates for variations in the emission yield (emission intensity per sputtered atom). Some examples of quantitative in-depth profiles, obtained with the proposed calculation model, are presented.

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