Mask Technology For X-Ray Step-And-Repeat System
- 30 June 1986
- conference paper
- Published by SPIE-Intl Soc Optical Eng
- Vol. 632, 106-118
- https://doi.org/10.1117/12.963675
Abstract
An x-ray mask suitable for use with a new x-ray step-and-repeat alignment system [1] is introduced. Design features are described which distinguish this stepper mask from the full-field x-ray mask reported earlier [2]. Processes for manufacturing such masks, patterned additively or subtractively, are described, as is the e-beam imaging technique. Finally, mask distortion results are presented and discussed with relation to mask design.Keywords
This publication has 0 references indexed in Scilit: