Determination of hydrogen concentration depth profiles in a-Si:H by Secondary Neutral Mass Spectrometry (SNMS)
- 1 December 1989
- journal article
- Published by Elsevier in Journal of Non-Crystalline Solids
- Vol. 114, 208-210
- https://doi.org/10.1016/0022-3093(89)90115-4
Abstract
No abstract availableThis publication has 4 references indexed in Scilit:
- Plasma studies on the Leybold–Heraeus INA3 secondary neutral mass spectrometry systemJournal of Vacuum Science & Technology A, 1988
- Quantitative depth profile and bulk analysis with high dynamic range by electron gas sputtered neutral mass spectrometryJournal of Vacuum Science & Technology A, 1988
- Recent applications of secondary neutral mass spectrometry for quantitative analysis of homogeneous and structured samplesNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1988
- Characterization of reactively magnetron sputtered hydrogenated amorphous silicon filmsJournal of Vacuum Science & Technology A, 1986