Ion‐Beam Etching of Amorphous CoNbZr Alloy with Tri‐level Resist as Mask to Form Fluxguides in Thin‐Film Heads
- 1 March 1990
- journal article
- Published by The Electrochemical Society in Journal of the Electrochemical Society
- Vol. 137 (3) , 993-995
- https://doi.org/10.1149/1.2086594
Abstract
No abstract availableThis publication has 0 references indexed in Scilit: