Measurement of surface roughness in buried channel waveguides

2 July 1992

journal article
Published by Institution of Engineering and Technology (IET) in Electronics Letters

Vol. 28 (14) , 1321-1322
https://doi.org/10.1049/el:19920839

Abstract

An atomic force microscope is employed in a novel method for measuring the edge roughness of masks used in the fabrication of rectangular-core buried channel waveguides. Light attenuation due to scattering loss from the sides of the core can then be estimated using a simple statistical model of the data.

Keywords

MASK EDGE ROUGHNESS
WAVEGUIDE FABRICATION MASK
LIGHT ATTENUATION ESTIMATION
RECTANGULAR-CORE
ATOMIC FORCE MICROSCOPE
STATISTICAL MODEL
SCATTERING LOSS
BURIED CHANNEL WAVEGUIDES
SURFACE ROUGHNESS
AFM

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