Fourier transform IR monitoring of porous silicon passivation during post-treatments such as anodic oxidation and contact with organic solvents
- 1 January 1995
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 255 (1-2) , 200-203
- https://doi.org/10.1016/0040-6090(94)05654-v
Abstract
No abstract availableKeywords
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