Amorphous and microcrystalline silicon solar cells prepared at high deposition rates using RF (13.56MHz) plasma excitation frequencies
- 30 October 2000
- journal article
- Published by Elsevier in Solar Energy Materials and Solar Cells
- Vol. 66 (1-4) , 267-273
- https://doi.org/10.1016/s0927-0248(00)00183-5
Abstract
No abstract availableKeywords
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- Potential of amorphous silicon for solar cellsApplied Physics A, 1999
- Microcrystalline silicon and micromorph tandem solar cellsApplied Physics A, 1999
- High Rate Deposition of Microcrystalline Silicon Using Conventional Plasma-Enhanced Chemical Vapor DepositionJapanese Journal of Applied Physics, 1998
- High deposition rates for microcrystalline silicon with low temperature plasma enhanced chemical vapor deposition processesJournal of Non-Crystalline Solids, 1998