Ion-Bombardment-Induced Improvement of Photoresist Mask Properties for RF Sputter-Etching
- 1 August 1977
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 16 (8) , 1313-1318
- https://doi.org/10.1143/jjap.16.1313
Abstract
No abstract availableKeywords
This publication has 0 references indexed in Scilit: