Self-assembled monolayer resists and nanoscale lithography of silicon dioxide thin films by chemically enhanced vapor etching (CEVE)
- 31 October 1996
- journal article
- Published by Elsevier in Superlattices and Microstructures
- Vol. 20 (3) , 369-376
- https://doi.org/10.1006/spmi.1996.0091