Fabrication of binary phase surface relief optical elements by selective deposition of dielectric layers

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Abstract
We propose and demonstrate a new scheme to fabricate surface relief binary phase elements by using selective deposition of dielectric layers through a contact mask. By using in situ optical thickness monitoring, accurate (∼1%), repeatable, and robust layer thicknesses are readily obtained, leading to accurate phases. We demonstrate our scheme by forming a circular π phase element that is used to form a dark optical trap for atoms.

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