XPS Sputter Depth Profiling Applid to the Analysis of Si/SiO2, Si/SiOxNy and Si/Si3N4
- 1 January 1991
- journal article
- Published by Trans Tech Publications, Ltd. in Solid State Phenomena
- Vol. 19-20, 593-598
- https://doi.org/10.4028/www.scientific.net/ssp.19-20.593
Abstract
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