Investigation of rf-sputtered Nd–glass films for integrated optics
- 1 January 1979
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science and Technology
- Vol. 16 (1) , 20-24
- https://doi.org/10.1116/1.569862
Abstract
The rf sputtering of Nd–glass films from targets containing low dissociation energy oxides has been investigated, and factors affecting optical quality and process time are discussed. These include gas composition and pressure, input power density, substrate temperature, annealing, surface damage, and thermal properties of both host glass and substrate. Several methods for overcoming anion depletion in the films and reducing waveguide losses are evaluated.Keywords
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