Extended cavity ridge waveguide lasers operatingat 1.5 µm using a simpledamage induced quantum well intermixing process

Abstract
The authors report extended cavity ridge waveguide lasers in InGaAs/InGaAsP, intermixed by damage induced via a silica sputtering process, with selective intermixing achieved through photoresist masking. Laser threshold currents indicate passive waveguide losses of 4.4 cm–1.