Application of synchrotron radiation to x-ray lithography
- 1 December 1976
- journal article
- research article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 47 (12) , 5450-5459
- https://doi.org/10.1063/1.322577
Abstract
Synchrotron radiation from the German electron synchrotron DESY in Hamburg has been used for x‐ray lithography. Replications of different master patterns (for magnetic bubble devices, Fresnel zone plates, etc.) were made using various wavelengths and exposures. High‐quality lines down to 500 Å wide have been reproduced using very soft x rays. The sensitivities of x‐ray resists have been evaluated over a wide range of exposures. Various critical factors (heating, radiation damage, etc.) involved with x‐ray lithography using synchrotron radiation have been studied. General considerations of storage ring sources designed as radiation sources for x‐ray lithography are discussed, together with a comparison with x‐ray tube sources. The general conclusion is that x‐ray lithography using synchrotron radiation offers considerable promise as a process for forming high‐quality‐submicron images with exposure times as short as a few seconds.This publication has 5 references indexed in Scilit:
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