Photocatalytic and Photoelectrochemical Properties of Nitrogen-Substituted TiO2 Thin Films Prepared by an RF Magnetron Sputtering Deposition Method
- 15 May 2007
- journal article
- Published by Trans Tech Publications, Ltd. in Materials Science Forum
- Vol. 544-545, 107-110
- https://doi.org/10.4028/www.scientific.net/msf.544-545.107
Abstract
Highly nitrogen-substituted TiO2 (N-TiO2) thin film photocatalysts were prepared by a radio-frequency magnetron sputtering (RF-MS) deposition method. N-TiO2 thin films with low nitrogen concentration (0.5%) exhibited a small absorption band as a shoulder in the 400-500 nm wavelength region, indicating that isolated N 2p orbitals are formed above the O 2p orbitals. However, N-TiO2 with higher nitrogen concentration (6%) exhibited a sharp absorption edge at 500 nm, indicating that visible light absorption is due to a band gap transition. These N-TiO2 thin films could operate as photocatalysts to decompose 2-propanol diluted in water under visible light. The band structure of N-TiO2 was also determined by photoelectrochemical measurements and H2 and O2 evolution was carried out from an aqueous solution involving sacrificial reagents.Keywords
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