Phase Transformations in the Ni-Ti-Si System
- 16 July 1991
- journal article
- research article
- Published by Wiley in Physica Status Solidi (a)
- Vol. 126 (1) , 171-179
- https://doi.org/10.1002/pssa.2211260119
Abstract
No abstract availableKeywords
This publication has 9 references indexed in Scilit:
- Ti/Ni bilayers on silicon: Sputter-induced intermixing, rapid thermal annealing and ternary silicide formationThin Solid Films, 1989
- Silicide formation for Co/Ti/Si structures processed by RTP under vacuumApplied Surface Science, 1989
- Silicide formation from ternary metal-metal-silicon systemsThin Solid Films, 1988
- Interactions of four metallic compounds with Si substratesJournal of Applied Physics, 1986
- Variation of the nucleated products in ultrathin films of Ti-Co on Si substrates with processing changesJournal of Applied Physics, 1986
- Rapid Thermal Annealing of Sputtered Ti-Ni-Si FilmsMRS Proceedings, 1986
- First nucleation rule for solid-state nucleation in metal-metal thin-film systemsApplied Physics Letters, 1982
- On the heat of mixing of liquid alloyS—IIJournal of the Less Common Metals, 1976
- On the heat of formation of solid alloys. IIJournal of the Less Common Metals, 1976