Fluorocarbon high density plasmas. VIII. Study of the ion flux composition at the substrate in electron cyclotron resonance etching processes using fluorocarbon gases
- 1 July 1994
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology A
- Vol. 12 (4) , 1287-1292
- https://doi.org/10.1116/1.579310
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