An Improved Polishing Technique for GaAs

• 1 January 1972
• journal article
• Published by The Electrochemical Society in Journal of the Electrochemical Society
• Vol. 119  (12) , 1778-1779
• https://doi.org/10.1149/1.2404099

Abstract

Keywords

• GALLIUM ARSENIDE
• CHEMICAL MECHANICAL POLISHING
• SEMICONDUCTOR DEVICE MANUFACTURE
• SODIUM COMPOUNDS
• OXYGEN COMPOUNDS
• CHLORINE COMPOUNDS
• SUBSTRATES
• CRYSTALS
• DOPING
• CHROMIUM
• TELLURIUM
• GAAS
• CHEMICAL POLISHING
• SURFACE FLATNESS
• NAOCL