Formation and properties of TiSi2 films
- 1 February 1983
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 100 (1) , 1-8
- https://doi.org/10.1016/0040-6090(83)90223-7
Abstract
No abstract availableThis publication has 3 references indexed in Scilit:
- Silicide formation in thin cosputtered (titanium + silicon) films on polycrystalline silicon and SiO2.Journal of Applied Physics, 1980
- Thin film interaction between titanium and polycrystalline siliconJournal of Applied Physics, 1980
- Review of binary alloy formation by thin film interactionsJournal of Vacuum Science and Technology, 1979