Magnetron sputtering with additional ionization effect by electron beam
- 1 January 1982
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science and Technology
- Vol. 20 (1) , 98-99
- https://doi.org/10.1116/1.571320
Abstract
The effects of electron beam ionization on the adhesion strength, plasma potential, and crystallinity of Cu films deposited on a glass substrates has been studied. (AIP)Keywords
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