The Electrodeposition of Cadmium from Non-aqueous Solutions: Pt. II Deposition from Mixed Iodide-Dimethylformamide Systems

Publisher Website
Google Scholar
Abstract
A metallographic study of the electrodeposition of cadmium from dimethylformamide solutions of (a) CdI2, (b) CdI2-ethylene diamine, (c) CdI2-KI, (d) CdI2-tetraethyl ammonium iodide and (e) CdI2-tetrapropyl ammonium iodide has been made. Isolated crystal deposits were obtained from baths (a) and (b) and below a critical current density from baths (c) 15 mA/cm2 and (d) 35mA/cm2. Substrate oriented deposits were formed at current densities above the critical value in baths (c) and (d) and at low current densities in bath (e). Above a critical current density (70 mA/cm2) in bath (e) fine-grained columnar deposits up to ~40μm thick were produced with a coating current efficiency of 30–40%. Preliminary studies of deposition in bath (e) using electron microscopy indicate that hindered growth occurs. The results are discussed in the light of probable complex formation and electrode inhibition by tetraalky1 ammonium ions.